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Effect of Gauss doping profile on electric potential of p-n diode

机译:高斯掺杂分布对p-n二极管电势的影响

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This study aimed to determine the effects of Gauss doping profile on electric potential of p-n diode. This effect is studied by simulating PN diodes at equilibrium condition with differences in doping fall-off constant (dfc) using MATLAB and COMSOL software. According to the simulation results, it concluded that p-n diode with different Gaussian doping profile, will produce similar built-in voltage (VGbi). But, each p-n diode with different Gaussian doping profile, has different maximum junction voltage (Vjmax) and minimum junction voltage (Vjmin). These junction voltages have strong correlation with dfc. We propose an equation of built-in voltage for Gauss Doping Profile, and also equations of Vjmax and Vjmin
机译:这项研究旨在确定高斯掺杂分布对p-n二极管电势的影响。通过使用MATLAB和COMSOL软件在平衡条件下模拟PN二极管(具有掺杂下降常数(dfc)的差异)来研究这种效应。根据仿真结果,得出结论,具有不同高斯掺杂分布的p-n二极管将产生相似的内置电压(V Gbi )。但是,每个具有不同高斯掺杂分布的p-n二极管具有不同的最大结电压(V jmax )和最小结电压(V jmin )。这些结电压与dfc具有很强的相关性。我们提出了高斯掺杂分布的内置电压方程,以及V jmax 和V jmin •的方程

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