首页> 外文会议>Nano Science and Technology Institute(NSTI) Nanotechnology Conference and Trade Show(NSTI Nanotech 2006) vol.3 >Accuracy of Surface-Potential-Based Long-Wide-Channel MOS Transistor Compact Models
【24h】

Accuracy of Surface-Potential-Based Long-Wide-Channel MOS Transistor Compact Models

机译:基于表面电位的长通道MOS晶体管紧凑模型的精度

获取原文
获取原文并翻译 | 示例

摘要

This paper answers the frequently asked question, "How accurate are the approximate baseline long-and-wide-channel MOS transistor models that have been used to develop the compact models for computer-aided circuit designs?" Three commonly used surface-potential-basedrn(U_S=qψ_S/kT) approximations of the bulk-charge arernevaluated: Q_B ∝ (ⅰ) (U_S)~(1/2), (ⅱ) (U_S-1)~(1/2), and (ⅲ) [U_S-1+exp(-U_S)]~(1/2). Self-consistent remote charge neutrality boundary condition, minority carriers, and space constant impurity concentration and oxide thickness are used. Percentage deviations of the approximations from the non-compact baseline model are computed for DC drain current, drain- and trans-conductances. Approximation (ⅰ) shows significant devia-tions, ~16% at threshold diverging rapidly with deepening into the subthreshold range. Approximations (ⅱ) and (ⅲ) show a few percent (1% to 2%) deviations in both inversion and subthreshold ranges, but diverge widely below sub-threshold and in accumulation. A new analytical model is tested and shows better than 10% accuracy in accumulation.
机译:本文回答了一个常见问题,“用于开发用于计算机辅助电路设计的紧凑模型的近似基线长和宽通道MOS晶体管模型有多精确?”重新评估了三种常用的基于表面电势的rn-(U_S =qψ_S/ kT)近似值:Q_B ∝(ⅰ)(U_S)〜(1/2),(ⅱ)(U_S-1)〜(1 / 2)和(ⅲ)[U_S-1 + exp(-U_S)]〜(1/2)。使用自洽的远程电荷中性边界条件,少数载流子以及空间常数杂质浓度和氧化物厚度。对于直流漏极电流,漏极和跨导,计算了与非紧凑型基线模型近似值的百分比偏差。近似值(ⅰ)显示出明显的偏差,阈值处的偏差约为16%,并随着进入阈值以下范围而加深。近似值(ⅱ)和(ⅲ)在反演和亚阈值范围内均显示百分之几(1%至2%)的偏差,但在亚阈值以下和累积范围内差异很大。新的分析模型经过测试,显示出超过10%的准确度。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号