首页> 外文会议>Nano Science and Technology Institute(NSTI) Nanotechnology Conference and Trade Show(NSTI Nanotech 2006) vol.3 >Development and Design Kit Integration of a Scalable and Statistical High Current Model for Advanced SiGe HBTs
【24h】

Development and Design Kit Integration of a Scalable and Statistical High Current Model for Advanced SiGe HBTs

机译:用于高级SiGe HBT的可扩展和统计大电流模型的开发和设计套件集成

获取原文
获取原文并翻译 | 示例

摘要

We present the extraction of a scalable High Current Model (Hicum) for advanced SiGe HBTs and its integration into BiCMOS design kits. Various model choices are reviewed and the extraction of model parameters is described in detail. Separation of the model parameters into intrinsic and extrinsic parts or area and perimeter parts, so as to accomplish proper geometric scaling, is discussed. The applicability of this methodology for technologies with f_T from 40-200GHz and BVCEO between 1.8-6.0V is confirmed and some specific results for a 200GHz HBT are presented. We obtain excellent correlation with data covering DC characteristics, S-parameters up to 100GHz, high-frequency noise parameters, linearity and distortion characteristics. Statistics are developed based on hardware specially processed to reflect process-variations. Monte-Carlo simulations vs process corners are shown for DC current gain and base-emitter voltage.
机译:我们介绍了用于高级SiGe HBT的可扩展大电流模型(Hicum)的提取及其与BiCMOS设计套件的集成。审查了各种模型选择,并详细描述了模型参数的提取。讨论了将模型参数分为内在和外在部分或面积和周长部分,以实现适当的几何比例缩放的问题。确认了该方法对于f_T为40-200GHz且BVCEO为1.8-6.0V的技术的适用性,并给出了200GHz HBT的一些具体结果。我们获得的数据与直流特性,高达100GHz的S参数,高频噪声参数,线性和失真特性之间具有极好的相关性。统计信息是根据经过特殊处理以反映过程差异的硬件开发的。显示了针对直流电流增益和基极-发射极电压的蒙特卡洛仿真与工艺角的关系。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号