首页> 外文会议>Nano Science and Technology Institute(NSTI) Nanotechnology Conference and Trade Show(NSTI Nanotech 2006) vol.3 >Device Correlation: Modeling using Uncorrelated Parameters, Characterization Using Ratios and Differences
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Device Correlation: Modeling using Uncorrelated Parameters, Characterization Using Ratios and Differences

机译:器件相关性:使用不相关参数进行建模,使用比率和差异进行表征

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Partial correlations between parameters of different types of devices, such as effective channel length for PMOS and NMOS devices, are often modeled and simulated statistically via correlation coefficients. However, this is cumbersome and inefficient from a modeling perspective, from a characterization perspective, and from a simulation perspective. We have found that, with physical understanding, it is possible to formulate models with a combination of parameters that are common to, and completely correlated between, different types of devices and parameters that are unique to, and completely independent between, different types of devices. This gives a modeling basis of independent statistical parameters, which is ideal for simple statistical simulation, yet completely encompasses statistical correlations between different device types. The key then is how these underlying parameters, which are not directly observable from measurements of a single type of device or electrical performance, can be characterized. We show that by identifying ratios or differences of electrical measurements between device types these "hidden" physical parameters can be easily characterized statistically. We also show that the technique gives error free values for the variances of the correlated parameters, and allows oxide thickness variation to be characterized from simple DC measurements.
机译:通常通过相关系数对不同类型的设备的参数之间的局部相关性(例如PMOS和NMOS器件的有效沟道长度)进行部分建模和统计。然而,从建模的角度,从特性的角度以及从仿真的角度来看,这是麻烦且低效的。我们发现,通过物理理解,可以用不同类型的设备共有且完全相关的参数组合和不同类型的设备独有且完全独立的参数来组合模型。这为独立的统计参数提供了建模基础,这对于简单的统计仿真非常理想,但完全涵盖了不同设备类型之间的统计相关性。然后,关键是如何表征这些基本参数,这些参数不能从单个类型的设备或电气性能的测量中直接观察到。我们表明,通过识别设备类型之间电测量的比率或差异,这些“隐藏”的物理参数可以轻松地进行统计表征。我们还表明,该技术可为相关参数的变化提供无误差的值,并允许通过简单的DC测量来表征氧化物厚度的变化。

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