首页> 外文会议>2003 Nanotechnology Conference and Trade Show Nanotech 2003 Vol.1 Feb 23-27, 2003 California, USA >Nanomachining on Si (100) Surface using an Atomic Force Microscope with a Lateral Force Transducer
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Nanomachining on Si (100) Surface using an Atomic Force Microscope with a Lateral Force Transducer

机译:使用带有横向力传感器的原子力显微镜在Si(100)表面上进行纳米加工

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Nanoscale machining on Si surfaces has been performed using an atomic force microscope combined with a two-axis capacitive force/displacement transducer. In scratching on Si (100) surfaces by a diamond tip with a radius of about 50 nm, the minimum normal force where a reproducible groove is generated is about 25 μN. It is possible to produce a nanoscale groove with a depth of 0.2 nm and a width of 20 nm at a normal force of 30 μN. The nanoscale scratch grooves are produced by very complicated processes including rubbing, ploughing, nanoscale-wear, chemical action and so on. In addition, it is demonstrated that the fine letters "UUPE" (a letter with dimensions 600x600x3 nm~3) are successfully written by mechanical scratching.
机译:使用原子力显微镜结合两轴电容式力/位移传感器,可以在Si表面进行纳米级加工。在用半径约为50 nm的金刚石尖端在Si(100)表面上进行刮擦时,产生可复制凹槽的最小法向力约为25μN。可以在30μN的法向力下产生深度为0.2 nm,宽度为20 nm的纳米级凹槽。纳米级划痕凹槽是通过非常复杂的过程制成的,这些过程包括摩擦,耕作,纳米级磨损,化学作用等。另外,证明了通过机械刮擦成功地写出了精细字母“ UUPE”(尺寸为600x600x3 nm〜3的字母)。

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