首页> 外文会议>10th EMAS regional workshop on electron probe microanalysis of materials today : Practical aspects >MICROSTRUCTURE AND CHEMICAL COMPOSITION OF (Cu+5at Ni)/Sn-Ag-Sn/(Cu+5at Ni) INTERCONNECTIONS
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MICROSTRUCTURE AND CHEMICAL COMPOSITION OF (Cu+5at Ni)/Sn-Ag-Sn/(Cu+5at Ni) INTERCONNECTIONS

机译:(Cu + 5at%Ni)/ Sn-Ag-Sn /(Cu + 5at%Ni)互连的微观结构和化学组成

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摘要

Comprehensive scanning (SEM) and transmission (TEM) electron microscopy studies of the (Cu+5at% Ni)/Sn-Ag-Sn/(Cu+5at% Ni) diffusion-soldered interconnecttions were performed. Sn and Ag are frequently used as substitutes of Pb-Sn eutectic alloys in electronic devices. The addition of the Ni to the substrate leads to the acceleration of intermetallic phase growth accompanied with the shape change of the IC. On the other hand, the thin (5 μm) Ag interlayer is applied in order to avoid formation of Kirkendall's voids in the centre of the Cu(Ni)/Sn/Cu(Ni) joints. The microstructure and chemical composition characterisation of the structural components after soldering were carried out using the scanning electron microscope (Fei XL30 E-SEM) equipped with an energy-dispersive X-ray spectrometer (Edax Gemini 4000). An intensive study of phenomena occurring mainly at the interfaces between the different phases, were accomplished on the transmission electron microscope Tecnai G2 FEG super Twin (200 kV) equipped with the high angle angular dark field (HAADF) detector and integrated with an energy-dispersive X-ray spectroscopy (EDS) system manufactured by Edax. The thin foils were cut out from the carefully selected regions of the interconnection using a Quanta 3D focused ion beam. The electron microscopy techniques with particular emphasis on the EDS and selected area electron diffraction allowed to reveal the presence of two intermetallic compounds ((Cu_(1-x)Ni_x)_6Sn_5 and Ag_3Sn) in the whole reaction zone for the various soldering times (2, 5, 10, 15 and 20 minutes) and temperatures (240 - 260 ℃). The (Cu_(1-x)Ni_x)_6Sn_5 phase has grown in the whole reaction zone. Additionally, the Ag_3Sn was detected in the centre of interconnection in the form of the relatively large, rounded grains. Furthermore, the EDS analysis (point to point and mapping) made across the substrate/IC interface showed the presence of layer significantly enriched in nickel.
机译:对(Cu + 5at%Ni)/ Sn-Ag-Sn /(Cu + 5at%Ni)扩散焊接互连进行了综合扫描(SEM)和透射(TEM)电子显微镜研究。 Sn和Ag经常被用作电子设备中Pb-Sn共晶合金的替代品。将Ni添加到衬底中导致金属间相生长的加速,伴随着IC形状的改变。另一方面,为了避免在Cu(Ni)/ Sn / Cu(Ni)接头中心形成Kirkendall空隙,使用了薄的(5μm)Ag中间层。焊接后结构部件的微观结构和化学成分表征是使用配有能量色散X射线光谱仪(Edax Gemini 4000)的扫描电子显微镜(Fei XL30 E-SEM)进行的。对透射电镜Tecnai G2 FEG super Twin(200 kV)进行了深入研究,该现象主要发生在不同相之间的界面上,该显微镜配备了高角度角暗场(HAADF)检测器并集成了能量色散Edax制造的X射线光谱(EDS)系统。使用Quanta 3D聚焦离子束从仔细选择的互连区域中切出薄箔。电子显微镜技术特别着重于EDS和选定区域的电子衍射,从而揭示了在各种焊接时间下,整个反应区域中存在两种金属间化合物((Cu_(1-x)Ni_x)_6Sn_5和Ag_3Sn)(2 ,5、10、15和20分钟)和温度(240-260℃)。 (Cu_(1-x)Ni_x)_6Sn_5相在整个反应区中生长。另外,在互连的中心以较大的圆形颗粒的形式检测到Ag_3Sn。此外,在基板/ IC界面上进行的EDS分析(点对点和映射)表明存在明显富集镍的层。

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  • 会议地点 Padua(IT)
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    Polish Academy of Sciences, Alex. Krupkowski Institute of Metallurgy and Materials Science ul. W. Reymonta 25, PL-30059 Krakow, Poland;

    Polish Academy of Sciences, Alex. Krupkowski Institute of Metallurgy and Materials Science ul. W. Reymonta 25, PL-30059 Krakow, Poland;

    Polish Academy of Sciences, Alex. Krupkowski Institute of Metallurgy and Materials Science ul. W. Reymonta 25, PL-30059 Krakow, Poland;

    Eindhoven University of Technology, Laboratory of Materials and Interface Chemistry P.O. Box 513, NL-5600 MB Eindhoven, The Netherlands;

    Polish Academy of Sciences, Alex. Krupkowski Institute of Metallurgy and Materials Science ul. W. Reymonta 25, PL-30059 Krakow, Poland;

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