MEMS devices require high topographic structures. Many of them cause problems for resist process withspin coating technique. Another problem is the high distance for exposure tool which reduce the resolution dramatically.In order to solve these problems, Suss developed spray coating technology and large gap exposureoptics. New development of so called MO (Microlens Optics) exposure Optics makes high resolution insubmicron area with large proximity distance possible.
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机译:Valutazione del Trattamento superficiale sulle prestazioni meccaniche a Fatica di Impianti in Titanio plasma-sprayed e Titanio sabbiato e mordenzato(Titaniumio-sprayed and sandblas的机械疲劳性能表面处理评估)