The electrodeposition of TiB2 on graphite was carried out from TiO2-B2O3-LiF-KF melts using CCP(continuous current plating) and PCP(pulsed current plating). The effects of cathodtc current density and B/Ti molar ratio on the coating were examined, the composition of coating were identified by X-Ray .diffraction and the morphology was observed by electron scanning microscope. The coatings electrodeposited by PCP revealed better qualities compared with those obtained by CPC, they were uniform, dense, adherent and fewer cracks with metallic brightness and very fine grains, when the following conditions were used :(TiO2: B2O3: KF: LiF molar ratio=0.06: 0.4t 0.74: 0.8, ton/toff 3/1,pulsed interval 2.3ms,pulse frenquencyies 100HZ .current density 0.6 A.cm-2, depositing time 50min) .
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机译:Eletroformacao:principios Eletroquimicos processo de Eletrodeposicao E Eletroformacao de Cobre(Electroformation:Electrodeposition and Electroformation of Copper的原理电化学过程)