In this paper, we discuss photomask technology developments to meet the requirements of advanced IC manufacturing effectively and economically. We concentrate our discussions in the following three areas: photomask data handling, advanced photomask fabrication and global customer services. Based on the discussion, we explain the importance of the technical cooperation a-mong IC design-houses, wafer-foundries and photomask vendors in today's highly competitive global IC markets, and the potential joint-development projects in different stages of new wafer-process technology development. It is our believe that the solutions of the success in future advanced IC manufacturing, for example, early product to market, fast design turn-around time and low manufacturing cost, are the joint technology development among the key technology partners in wafer-process technology development.
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机译:The Thorax:A Integrated Approach Lee,2003年LeeD The Thorax:A Integrated Approach 2nd ed.2003 Diane G Lee Physiotherapist Corporation White Rocks,Canada0-9732363-0-2144 pp。