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首页> 外文期刊>Journal of the American Chemical Society >AFM-Induced Amine Deprotection: Triggering Localized Bond Cleavage by Application of Tip/Substrate Voltage Bias for the Surface Self-Assembly of Nanosized Dendritic Objects
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AFM-Induced Amine Deprotection: Triggering Localized Bond Cleavage by Application of Tip/Substrate Voltage Bias for the Surface Self-Assembly of Nanosized Dendritic Objects

机译:原子力显微镜诱导的胺脱保护:纳米/树枝状物体表面自组装的尖端/基板电压偏置的应用触发局部键断裂。

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摘要

We have achieved patternwise fabrication of a primary aliphatic amine surface on the nanometer scale and shown that the amines are active toward ionic self-assembly. The relationship between the size of the macromolecule and the height of the resulting features is strong evidence that the features are indeed composed of these molecules. We expect that this process will be applicable wherever amines can be used to selectively assemble materials onto a surface. Specifically, the use of amines for deposition of resist materials for lithography, electroless metaliza-tion, device assembly, and protein binding can all be applied on the nanometer length scale. This work potentially provides a method for sequential patternwise deposition of single molecules and may be applied to the surface assembly of more complex molecular machines.
机译:我们已经完成了纳米级伯脂族胺表面的图案化制备,并且表明胺对离子自组装具有活性。大分子的大小与所得特征的高度之间的关系有力地证明了这些特征确实由这些分子组成。我们希望,只要胺可用于将材料选择性地组装到表面上,该方法都将适用。具体而言,使用胺来沉积用于光刻,化学镀金属,器件组装和蛋白质结合的抗蚀剂材料都可以在纳米级尺度上进行。这项工作潜在地提供了一种用于顺序地按顺序沉积单个分子的方法,并且可以应用于更复杂的分子机器的表面组装。

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