Oxidized Gold as an Ultrathin Etch Resist Applied in Microcontact Printing

摘要

In this report it is described how a gold surface can be treated with an oxygen plasma to become an effective etch mask.The barrier is expected to be less sensitive to defects than traditional self-assembled monolayer (SAM) barriers and,contrary to these conventional barriers,is expected to spontaneously deteriorate in time.Using a novel patterning scheme based upon microcontact printing (mu CP) of a reductant ink,patterns can be created that can be selectively etched (Figure 1).Such a scheme offers advantages similar to those of positive microcontact printing ((+)mu CP).